Pfeiffer Vacuum + Fab Solutions Stuns at SEMICON Southeast Asia with UltiDry P1820 and CT-TW-H Innovations

Pfeiffer Vacuum + Fab Solutions Stuns at SEMICON Southeast Asia with UltiDry P1820 and CT-TW-H Innovations

(IN BRIEF) Pfeiffer Vacuum + Fab Solutions, part of the Busch Group, showcased its latest vacuum pumps and gas abatement technologies at SEMICON Southeast Asia 2025 in Singapore. Central exhibits included the UltiDry P1820 Roots vacuum pump—accentuated by an animated holographic mascot—and a 3D-printed demo of a complete semiconductor fab illustrating integration points for vacuum and abatement systems. A life-size mock-up of the CT-TW-H thermal-wet hybrid abatement unit demonstrated hydrogen-injected combustion for efficient PFC destruction. Busch Group experts provided on-site consultations, with overwhelming positive feedback underscoring the company’s role as a driving force in sustainable, high-performance semiconductor production.

(PRESS RELEASE) AßLAR, 24-Jun-2025 — /EuropaWire/ — Pfeiffer Vacuum + Fab Solutions, a member of the Busch Group and a global frontrunner in vacuum and gas abatement technologies, delivered a standout presentation at SEMICON Southeast Asia 2025—the first edition of the event in Singapore since 2013—held from May 20 to 22. As Southeast Asia cements its role in the worldwide semiconductor ecosystem, the exhibition attracted over 1,400 leading companies spanning chip design, wafer fabrication, packaging and testing, EDA/IP, equipment, and materials. At the heart of the Busch Group’s showcase was a comprehensive array of vacuum pumps and abatement systems designed to boost efficiency, sustainability, and performance in semiconductor production.

Highlighting the booth was the UltiDry P1820 multi-stage Roots vacuum pump, engineered for premier reliability and energy savings under the rigorous demands of chip manufacturing. A captivating holographic display—with a spinning LED avatar of the UltiDry mascot—brought the pump’s efficiency metrics to life, drawing crowds eager to film and photograph the animated exhibit.

Adjacent to this, a 3D-printed scale model of a fully equipped semiconductor fab—from cleanroom to sub-fab—served as an interactive educational piece. Attendees explored each stage of the manufacturing workflow, gaining clear insight into where and how Busch Group’s vacuum and abatement solutions integrate within a modern fab environment.

Completing the lineup was a full-size mock-up of Pfeiffer’s CT-TW-H thermal-wet hybrid gas abatement system, featuring hydrogen-injected combustion technology for selective destruction of exhaust gases such as perfluorocarbons (PFCs). This system underscores high operational uptime, robust environmental performance, and straightforward maintenance—key attributes for eco-conscious fabs.

Throughout the exhibition, Busch Group sales and technical specialists engaged with visitors to tailor solutions for specific production challenges. The enthusiastic response from industry professionals confirmed the group’s leadership and ongoing commitment to pioneering innovations in semiconductor manufacturing.

Media Contact:

Sabine Neubrand-Trylat
Tel: +49 6441 802-1223

SOURCE: Pfeiffer Vacuum GmbH