Tag Archives: LIDE technology

Korean patent strengthens LPKF’s global leadership in precision laser-based glass structuring with LIDE technology

(IN BRIEF) LPKF Laser & Electronics SE has obtained new patent protection in Korea for its LIDE (Laser Induced Deep Etching) technology, effective September 1, 2025. The process enables ultra-precise, damage-free structuring of thin glass substrates, with applications across semiconductor … Read the full press release

LPKF and Onto Innovation Propel Advanced Packaging with Cutting-Edge Glass Processing Solutions

(IN BRIEF) LPKF Laser & Electronics SE has joined Onto Innovation’s Packaging Applications Center of Excellence (PACE) to accelerate the production of panel-level packages that use glass cores, crucial for modern semiconductor applications like high-performance computing and AI. LPKF will … Read the full press release