Busch Group to Showcase Cutting-Edge Vacuum and Abatement Solutions at SEMICON China 2025

Multi-stage dry vacuum pump UltiDry from Pfeiffer Vacuum+Fab Solutions. Source: Pfeiffer Vacuum+Fab Solutions.

(IN BRIEF) The Busch Group will present its cutting-edge vacuum and abatement solutions at SEMICON China 2025, showcasing innovations like Pfeiffer Vacuum+Fab Solutions’ UltiDry pump and centrotherm clean solutions’ high-temperature thermal abatement system. Visitors can explore these technologies designed to enhance semiconductor manufacturing infrastructure and sustainability.

(PRESS RELEASE) AßLAR, Germany, 14-Jan-2025 — /EuropaWire/ — At SEMICON China 2025, three key companies from the Busch Group—Busch Vacuum Solutions, Pfeiffer Vacuum+Fab Solutions, and centrotherm clean solutions—will come together to present their comprehensive suite of vacuum and abatement technologies. Their joint exhibit will highlight the collective expertise of the group, with a focus on advancing semiconductor manufacturing infrastructure in China.

The Busch Group’s booth will feature a range of products aimed at improving the efficiency and sustainability of semiconductor manufacturing. These include vacuum pumps, contamination management systems, leak detectors, valves, gas abatement solutions, and a full spectrum of sub-fab management tools, all tailored to meet the unique challenges of the semiconductor industry.

Highlighting Innovations in Vacuum and Abatement Technology

The exhibit will feature several groundbreaking innovations designed to address the growing demands of semiconductor production. One of the key products on display will be the UltiDry from Pfeiffer Vacuum+Fab Solutions, a multi-stage dry vacuum pump built for applications that require robustness and low energy consumption. Designed to excel under tough conditions, the UltiDry is perfect for managing powders and handling high inlet flows while ensuring lower power consumption. It is also resistant to corrosive gases, making it a reliable solution for demanding environments.

Another notable innovation from centrotherm clean solutions is their high-temperature thermal abatement system. This advanced system combines the advantages of flame abatement with the fuel-free benefits of plasma abatement, significantly reducing both operating costs and secondary emissions. It efficiently eliminates the molecular process gas NF3 while ensuring very low NOx emissions. This solution provides an environmentally sustainable option with a minimal carbon footprint for processes such as CVD and metal-etching.

Visitors to SEMICON China will have the opportunity to meet experts from Busch Vacuum Solutions, Pfeiffer Vacuum+Fab Solutions, and centrotherm clean solutions, who will be on hand at booth 2501 in Hall N2 of the Shanghai New International Expo Centre. The event, taking place from March 26 to 28, 2025, offers a unique opportunity to engage with industry leaders and explore the latest advancements in vacuum and abatement technologies.

Media contact:

Sabine Neubrand-Trylat
T +49 6441 802-1223

SOURCE: Pfeiffer Vacuum GmbH