Busch Group Partners with Pfeiffer Vacuum+Fab Solutions and centrotherm clean solutions to Showcase Cutting-Edge Semiconductor Technologies at Semicon Korea 2025

Busch Group Partners with Pfeiffer Vacuum+Fab Solutions and centrotherm clean solutions to Showcase Cutting-Edge Semiconductor Technologies at Semicon Korea 2025

(IN BRIEF) Busch Vacuum Solutions, Pfeiffer Vacuum+Fab Solutions, and centrotherm clean solutions will jointly showcase their innovative vacuum and abatement technologies at Semicon Korea 2025. Their featured products include advanced vacuum pumps, contamination management systems, and a high-performance thermal abatement system aimed at enhancing semiconductor manufacturing processes.

(PRESS RELEASE) AβLAR, 5-Feb-2025 — /EuropaWire/ — At Semicon Korea 2025, three key players in the semiconductor industry – Busch Vacuum Solutions, Pfeiffer Vacuum+Fab Solutions, and centrotherm clean solutions – are collaborating to showcase their expertise in vacuum solutions and technological innovation. Together, the companies will highlight their comprehensive range of products designed to improve the infrastructure of semiconductor manufacturing facilities in Korea. These offerings include vacuum pumps, contamination management systems, leak detectors, valves, gas abatement solutions, and sub-fab management solutions.

Among the featured products are the TORRI and UltiDry vacuum pumps, each offering tailored advantages for specific semiconductor applications. Busch Vacuum Solutions’ TORRI BD dry vacuum pumps are compact, energy-efficient, and designed for load lock chamber operations. These pumps offer quick pump-down times and stand out for their light weight and energy efficiency. On the other hand, the UltiDry pump, developed by Pfeiffer Vacuum+Fab Solutions, is a multi-stage dry vacuum pump that is designed for harsh applications. Known for its robustness, low energy consumption, and ability to handle corrosive gases, it is ideal for improving powder management and handling high inlet flows.

Centrotherm clean solutions’ high-temperature thermal abatement system is another highlight of the exhibition. This system combines flame abatement and plasma abatement technologies, offering significant cost savings while ensuring lower secondary emissions. It can efficiently destroy NF3, a molecular process gas, with minimal NOx emissions, contributing to a sustainable and eco-friendly solution for CVD and metal-etch processes.

Trade show attendees can explore these cutting-edge technologies from Busch Vacuum Solutions, Pfeiffer Vacuum+Fab Solutions, and centrotherm clean solutions at Semicon Korea 2025, taking place from February 19 to 21, 2025, at COEX in Seoul. For in-depth discussions, visitors can engage with the experts at booth 322 in hall C’s customer lounge.

Media Contact:

Heide Erickson
Tel: +49 6441 802-1360/+49 6441 802-1365

SOURCE: Pfeiffer Vacuum+Fab Solutions